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		<title>Superconductor on Extra Performance IR Heating</title>
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				<title>Superconductor chip fabrication lamp</title>
				<link>http://ir-heat-extra.com/en/posts/superconductor-chip-fabrication-lamp/</link>
				<pubDate>Wed, 17 Jun 2026 15:58:32 +0800</pubDate>
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				<description>&lt;p&gt;&lt;img src=&#34;http://ir-heat-extra.com/images/eeeb9669114c0c0a0b2bef3f902d01a9.png&#34; alt=&#34;Superconductor chip fabrication lamp&#34;&gt;&lt;/p&gt;&#xA;&lt;p&gt;On the fab floor, a photoresist soft bake at 95°C can drift by even 1.5°C, and the line-width control at the next lithography step starts to slip. For superconductor chip fabrication, that drift isn&amp;rsquo;t just yield loss—it&amp;rsquo;s a run failure.&lt;/p&gt;&#xA;&lt;h2 id=&#34;what-matters-technically&#34;&gt;What Matters Technically&lt;/h2&gt;&#xA;&lt;p&gt;We built the superconductor chip fabrication lamp around controlled radiant heating and tight thermal uniformity. It holds ±0.1°C stability across the wafer plane, so the photoresist sees the same temperature every time, whether it&amp;rsquo;s soft bake or hard bake.&#xA;The emitter design is low thermal mass, so it responds fast and keeps overshoot off the profile when recipes change. It runs in Class 1–100 &lt;a href=&#34;https://henruite.com&#34;&gt;cleanroom&lt;/a&gt; environments, with a sealed chamber path and low-outgassing materials, so particle count doesn&amp;rsquo;t creep up during long bake cycles. Closed-loop control keeps output repeatable, which helps hold critical dimension consistency right into the etch step.&lt;/p&gt;</description>
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